Programmable Refractive Index Of Nanoporous Organosilicate Films Through Microsphere Masking And Sacrificial Polymer Mediated Assembly

Author ORCID Identifier

Venumadhav Korampally https://orcid.org/0000-0002-5726-7211

Publication Title

IEEE International Conference on Electro Information Technology

ISSN

21540357

E-ISSN

21540373

ISBN

9781728153179

Document Type

Conference Proceeding

Abstract

We present our preliminary results on experimentation towards designing thin nanoparticle films with programmable refractive indices controlled by amorphous packing density of particles. A sacrificial polymer approach is used with substrate surface energy controlling the wetting of the polymer. Thus the local packing density, and consequentially the refractive index, is controlled by the surface energy of the substrate. Through the use of microsphere lithography and plasma induced isotropic mask shrinking, high and low surface energy regions are patterned on a sub-micron scale. With feature sizes this small, the flow of both the particles and the sacrificial polymer between high and low surface energy regions is overlapped. This creates a film with refractive index proportional to the fractional coverage of high and low surface

First Page

551

Last Page

556

Publication Date

9-29-2020

DOI

10.1109/EIT48999.2020.9208272

Department

Department of Electrical Engineering

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