Publication Date
2005
Document Type
Dissertation/Thesis
Degree Name
M.S. (Master of Science)
Legacy Department
Department of Electrical Engineering
LCSH
Lithography; Electron beam--Industrial applications
Recommended Citation
Mulcahy, Thomas L., "Process optimization for fabrication of nano scale resist patterns using electron beam lithography" (2005). Graduate Research Theses & Dissertations. 4524.
https://huskiecommons.lib.niu.edu/allgraduate-thesesdissertations/4524
Extent
xiii, 164 pages
Language
eng
Publisher
Northern Illinois University
Rights Statement
In Copyright
Rights Statement 2
NIU theses are protected by copyright. They may be viewed from Huskie Commons for any purpose, but reproduction or distribution in any format is prohibited without the written permission of the authors.
Media Type
Text
COinS
