Genis, Alan P.
M.S. (Master of Science)
Department of Electrical Engineering
Thick films||Electric resistors
The feasibility of using a Nd:YAG laser to reduce the resistance of fired thick film resistors (TFRs) has been previously reported. This study presents data on temperature coefficient-of-resistance, high temperature storage, voltage coefficient-of-resistance, and noise index analysis of laser treated TFRs. The resulting data is compared to the specifications defined by the ink manufactures. In addition to the stability tests, a mathematical model will be defined for analysis of the steady state heat transfer of this laser treatment process. This model will help facilitate further studies to better understand the physical mechanisms of this laser technique.
Giesecke, Daniel J., "Development of reducing resistance of thick film resistors by laser treatment" (1992). Graduate Research Theses & Dissertations. 2199.
viii, 126 pages
Northern Illinois University
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