Publication Date
1992
Document Type
Dissertation/Thesis
First Advisor
Genis, Alan P.
Degree Name
M.S. (Master of Science)
Legacy Department
Department of Electrical Engineering
LCSH
Thick films; Electric resistors
Abstract
The feasibility of using a Nd:YAG laser to reduce the resistance of fired thick film resistors (TFRs) has been previously reported. This study presents data on temperature coefficient-of-resistance, high temperature storage, voltage coefficient-of-resistance, and noise index analysis of laser treated TFRs. The resulting data is compared to the specifications defined by the ink manufactures. In addition to the stability tests, a mathematical model will be defined for analysis of the steady state heat transfer of this laser treatment process. This model will help facilitate further studies to better understand the physical mechanisms of this laser technique.
Recommended Citation
Giesecke, Daniel J., "Development of reducing resistance of thick film resistors by laser treatment" (1992). Graduate Research Theses & Dissertations. 2199.
https://huskiecommons.lib.niu.edu/allgraduate-thesesdissertations/2199
Extent
viii, 126 pages
Language
eng
Publisher
Northern Illinois University
Rights Statement
In Copyright
Rights Statement 2
NIU theses are protected by copyright. They may be viewed from Huskie Commons for any purpose, but reproduction or distribution in any format is prohibited without the written permission of the authors.
Media Type
Text
Comments
Includes bibliographical references (pages [70]-71)