Publication Date


Document Type


First Advisor

Genis, Alan P.

Degree Name

M.S. (Master of Science)

Legacy Department

Department of Electrical Engineering


Chemical vapor deposition; Diamond thin films


Chemical vapor deposition (CVD) techniques to grow diamond thin films and diamond-like carbon films are being used extensively in the microelectronics, optical, and medical industries. Hot filament chemical vapor deposition (HFCVD) is one specific method used to grow polycrystalline structure diamond thin films. The goal of the project was to design a HFCVD system with the equipment available in the Microelectronics Laboratory in the Department of Electrical Engineering at Northern Illinois University. It has been demonstrated that the HFCVD system is able to grow sp3 bonded carbon thin films which can be utilized for application purposes or for further research. This thesis reviews the background of diamond films, past and present research, design and implementation of the HFCVD system, and the results and analysis of the experiment. Finally, the summary and conclusion along with recommendations for future work are presented.


Includes bibliographical references (pages [124]-128)


x, 136 pages




Northern Illinois University

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