Genis, Alan P.
M.S. (Master of Science)
Department of Electrical Engineering
Chemical vapor deposition; Diamond thin films
Chemical vapor deposition (CVD) techniques to grow diamond thin films and diamond-like carbon films are being used extensively in the microelectronics, optical, and medical industries. Hot filament chemical vapor deposition (HFCVD) is one specific method used to grow polycrystalline structure diamond thin films. The goal of the project was to design a HFCVD system with the equipment available in the Microelectronics Laboratory in the Department of Electrical Engineering at Northern Illinois University. It has been demonstrated that the HFCVD system is able to grow sp3 bonded carbon thin films which can be utilized for application purposes or for further research. This thesis reviews the background of diamond films, past and present research, design and implementation of the HFCVD system, and the results and analysis of the experiment. Finally, the summary and conclusion along with recommendations for future work are presented.
Morrison, Evan L., "Design and implementation of a hot filament chemical vapor deposition system for diamond films" (1995). Graduate Research Theses & Dissertations. 2086.
x, 136 pages
Northern Illinois University
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