Publication Date

1995

Document Type

Dissertation/Thesis

First Advisor

Genis, Alan P.

Degree Name

M.S. (Master of Science)

Department

Department of Electrical Engineering

LCSH

Chemical vapor deposition||Diamond thin films

Abstract

Chemical vapor deposition (CVD) techniques to grow diamond thin films and diamond-like carbon films are being used extensively in the microelectronics, optical, and medical industries. Hot filament chemical vapor deposition (HFCVD) is one specific method used to grow polycrystalline structure diamond thin films. The goal of the project was to design a HFCVD system with the equipment available in the Microelectronics Laboratory in the Department of Electrical Engineering at Northern Illinois University. It has been demonstrated that the HFCVD system is able to grow sp3 bonded carbon thin films which can be utilized for application purposes or for further research. This thesis reviews the background of diamond films, past and present research, design and implementation of the HFCVD system, and the results and analysis of the experiment. Finally, the summary and conclusion along with recommendations for future work are presented.

Comments

Includes bibliographical references (pages [124]-128)

Extent

x, 136 pages

Language

eng

Publisher

Northern Illinois University

Rights Statement

In Copyright

Rights Statement 2

NIU theses are protected by copyright. They may be viewed from Huskie Commons for any purpose, but reproduction or distribution in any format is prohibited without the written permission of the authors.

Media Type

Text

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